Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate
2005-08-09
2005-08-09
Meeks, Timothy (Department: 1762)
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
C427S586000, C427S255600, C427S582000
Reexamination Certificate
active
06926933
ABSTRACT:
A water-repelling film is formed by using a vacuum ultraviolet rays chemical vapor deposition (CVD) system (100) comprising a vacuum ultraviolet rays generating section (102), a reaction room (106), and a window (104) for separating the reaction room (106) and the vacuum ultraviolet rays generating section (102). Plasma having an energy larger than 0 eV but smaller than 10 eV and organic material gas are supplied to the reaction room. A substrate (116) in the reaction room (106) is heated to maintain such a temperature as not causing damage on the substrate (116). Vacuum ultraviolet rays is applied from the vacuum ultraviolet rays generating section (102) to the inside of the reaction room (106) through the window (104).
REFERENCES:
patent: 6808758 (2004-10-01), Thakur
patent: 09043194 (1997-02-01), None
patent: 10-259037 (1998-09-01), None
patent: 2002-38094 (2002-02-01), None
JP Title “What is a high polymer material that repels water most” 45,566 1996 Masamichi Morita.
Miyano Jun-ichi
Motoyama Yoshikazu
Toshikawa Kiyohiko
Meeks Timothy
Oki Electric Industry Co. Ltd.
Takeuchi & Takeuchi
LandOfFree
Method of manufacturing water-repelling film does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of manufacturing water-repelling film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing water-repelling film will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3479709