Method of manufacturing water-repelling film

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma

Reexamination Certificate

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Details

C427S586000, C427S255600, C427S582000

Reexamination Certificate

active

06926933

ABSTRACT:
A water-repelling film is formed by using a vacuum ultraviolet rays chemical vapor deposition (CVD) system (100) comprising a vacuum ultraviolet rays generating section (102), a reaction room (106), and a window (104) for separating the reaction room (106) and the vacuum ultraviolet rays generating section (102). Plasma having an energy larger than 0 eV but smaller than 10 eV and organic material gas are supplied to the reaction room. A substrate (116) in the reaction room (106) is heated to maintain such a temperature as not causing damage on the substrate (116). Vacuum ultraviolet rays is applied from the vacuum ultraviolet rays generating section (102) to the inside of the reaction room (106) through the window (104).

REFERENCES:
patent: 6808758 (2004-10-01), Thakur
patent: 09043194 (1997-02-01), None
patent: 10-259037 (1998-09-01), None
patent: 2002-38094 (2002-02-01), None
JP Title “What is a high polymer material that repels water most” 45,566 1996 Masamichi Morita.

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