Photopolymerizable mixture, and a recording material produced th

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430915, 430287, 430288, 522 25, 522 26, G03F 7031

Patent

active

050859749

ABSTRACT:
A photopolymerizable mixture is disclosed which comprises

REFERENCES:
patent: 2850445 (1958-09-01), Oster
patent: 2875047 (1959-02-01), Oster
patent: 3097096 (1963-07-01), Oster
patent: 3488269 (1970-01-01), Allen et al.
patent: 3597343 (1971-08-01), Delzenne et al.
patent: 3759807 (1973-09-01), Osborn et al.
patent: 3782961 (1974-01-01), Takahashi
patent: 3850770 (1974-11-01), Juna et al.
patent: 3864133 (1975-02-01), Hisamatsu et al.
patent: 3960572 (1976-06-01), Ibata et al.
patent: 4019972 (1977-04-01), Faust
patent: 4054682 (1977-10-01), Kuesters et al.
patent: 4071424 (1978-01-01), Dart et al.
patent: 4250248 (1981-02-01), Faust
patent: 4266004 (1981-05-01), Kern
patent: 4279982 (1981-07-01), Iwasaki et al.
patent: 4293635 (1981-10-01), Flint et al.
patent: 4339566 (1982-07-01), Rosenkranz
patent: 4458007 (1984-07-01), Geissler et al.
patent: 4495271 (1985-01-01), Geissler et al.
patent: 4517281 (1985-05-01), Briney et al.
patent: 4559382 (1985-12-01), Martens et al.
patent: 4636459 (1987-01-01), Kawamura
patent: 4650743 (1987-03-01), Galloway
patent: 4732840 (1988-08-01), Hasegawa
patent: 4895788 (1990-01-01), Walls et al.
patent: 4956264 (1990-09-01), Geissler et al.
patent: 4983498 (1991-01-01), Rode et al.
Chemical Abstracts, 74-Radiation Chem., Photochem., vol. 85, 1976, 85:54620a, Photoresists For Printing Platemaking and Printed Circuit Fabrication, p. 555.
Photoresist, W. S. DeForest, McGraw-Hill Book Co., New York, pp. 178-183, 1975.
Photopolymerization of Surface Coatings, C. G. Roffey, John Wiley and Son, Chichester, pp. 182-185, 1982.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Photopolymerizable mixture, and a recording material produced th does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photopolymerizable mixture, and a recording material produced th, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photopolymerizable mixture, and a recording material produced th will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-347465

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.