Photosensitive material for immersion photolithography

Details Photosensitive material for immersion photolithography Photosensitive material for immersion photolithography

2005-08-02

2005-08-02

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S311000

Reexamination Certificate

active

06924081

ABSTRACT:
When rays of light converge inside a photosensitive material at angles larger than 70 degrees, one polarization of the light may fail to produce the desired image contrast in conventional exposure media. This invention describes a material which may be applied to a semiconductor wafer surface which ensures that the photosensitive material is exposed principally by light polarized parallel to the semiconductor wafer surface.

REFERENCES:
patent: 5173381 (1992-12-01), Natansohn et al.

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