Fluorinated photopolymer composition and waveguide device

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S281100, C430S286100, C430S288100, C430S270100, C430S009000, C430S018000, C430S321000, C430S916000, C522S183000, C522S182000, C526S242000

Reexamination Certificate

active

06929899

ABSTRACT:
A photosensitive composition having low absorption loss at 1,300-1,610 nm and is suitable for practical waveguide devices. The composition comprises at least one (meth)acrylate prepared from a fluorinated monomer or polymer having minimum two hydroxyl groups, at least one multifunctional non-fluorinated (meth)acrylate and at least one photoinitiator. An optical coating on a variety of substrates is obtained by exposing the photosensitive composition to actinic radiation such as UV light. An optical waveguide device is fabricated by patterning the photosensitive composition on a substrate.

REFERENCES:
patent: 3779627 (1973-12-01), Pinnow et al.
patent: 4138194 (1979-02-01), Beasley et al.
patent: 4609252 (1986-09-01), Wong et al.
patent: 4877717 (1989-10-01), Suzuki et al.
patent: 5054872 (1991-10-01), Fan et al.
patent: 5062680 (1991-11-01), Imamura et al.
patent: 5136682 (1992-08-01), Moyer et al.
patent: 5396350 (1995-03-01), Beeson et al.
patent: 5402514 (1995-03-01), Booth et al.
patent: 5462700 (1995-10-01), Beeson et al.
patent: 5481385 (1996-01-01), Zimmerman et al.
patent: 5822489 (1998-10-01), Hale
patent: 6005137 (1999-12-01), Moore et al.
patent: 6023545 (2000-02-01), Eldada et al.
patent: 6114090 (2000-09-01), Wu et al.
patent: 6162579 (2000-12-01), Stengel et al.
patent: 6306563 (2001-10-01), Xu et al.
patent: 6555288 (2003-04-01), Xu et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Fluorinated photopolymer composition and waveguide device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fluorinated photopolymer composition and waveguide device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fluorinated photopolymer composition and waveguide device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3471823

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.