Cleaning chamber surfaces to recover metal-containing compounds

Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...

Reexamination Certificate

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C134S002000, C134S022100, C134S022110, C134S022140, C134S022190, C134S026000, C134S028000, C134S041000, C134S042000, C134S902000

Reexamination Certificate

active

06902627

ABSTRACT:
In a method of cleaning metal-containing deposits such as tantalum from a surface of a process chamber component, such as a metal surface, the surface is immersed in a cleaning solution. In one version, the cleaning solution is a solution having HF and HNO3in a ratio that removes deposits from the surface substantially without eroding the surface. In another version, the cleaning solution is a solution having KOH and H2O2. The solution can be treated after cleaning the surface to recover tantalum-containing materials and one or more of the cleaning solutions.

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