Method and system for designing circuit layout

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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Details

C716S030000, C716S030000, C716S030000

Reexamination Certificate

active

06938231

ABSTRACT:
A circuit layout design method capable of an LSI circuit or an electronic printed circuit board free of electromagnetic interference is provided. The layout design method according to the invention includes a quasi-stationary circuit reduction step of deviding an entire circuit represented by a net list and a part library into a plurality of quasi-stationary closed circuits having a reduced size so that an intensity of an electromagnetic wave radiated from each of the quasi-stationary closed circuits is not more than a predetermined value; a wiring constraint condition calculation step of calculating constraint conditions for each of wirings mutually connecting the plurality of quasi-stationary closed circuits so that the intensity of the electromagnetic wave radiated from each of the wirings is not more than the predetermined value; and a layout step of laying out parts and the wirings based on the net list and the parts library so as to satisfy the constraint conditions.

REFERENCES:
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patent: 6594805 (2003-07-01), Tetelbaum et al.
patent: 2003/0200516 (2003-10-01), Eisenberg et al.
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patent: 2001-119154 (2001-04-01), None
patent: 2001-222573 (2001-08-01), None
Ymeri, Hasan et al., “New closed formula for frequency dependent resistance and inductance of IC interconnects on silicon substrate”, IOP Publishing Ltd, UK. obtained from http://ej.iop.org/links/q48/D+xQgxjNckZ4Du6gNfd+QA/jm1319.pdf, pp. 283-286.
List of Prior Art Documents with document origin prepared by applicant.
International Search Report relating to application PCT/JP02/01733 dated Mar. 26, 2002.
English translation of Abstract for Japanese Application No. JP 5-67174 A.
English translation of Abstract for Japanese Application No. JP 9-139573 A.
English translation of Abstract for Japanese Application No. JP 2001-119154 A.
English translation of Abstract for Japanese Application No. JP 2001-222573 A.
English translation of Abstract for Japanese Application No. JP 6-203102 A.

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