Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2005-09-20
2005-09-20
Pham, Long (Department: 2814)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S613000, C438S617000
Reexamination Certificate
active
06946380
ABSTRACT:
A tip of a wire formed in the shape of a ball is bonded to an electrode by using a tool. A part of the wire is drawn from the tip bonded to the electrode. A bump is formed on the electrode by deforming a portion of the wire continuous with the tip on the tip by using the tool. The wire is cut while leaving the bump on the electrode.
REFERENCES:
patent: 4442967 (1984-04-01), Van de Pas et al.
patent: 5874354 (1999-02-01), Heitzer et al.
patent: 5891796 (1999-04-01), Nakamura et al.
patent: 6180891 (2001-01-01), Murdeshwar
patent: A-57-163919 (1982-10-01), None
patent: A-63-173345 (1988-07-01), None
patent: A-01-293626 (1989-11-01), None
patent: A-02-250328 (1990-10-01), None
patent: A-03-014235 (1991-01-01), None
patent: A-03-183139 (1991-08-01), None
patent: A-03-233946 (1991-10-01), None
patent: A-04-123434 (1992-04-01), None
patent: A-05-275428 (1993-10-01), None
patent: A-05-326601 (1993-12-01), None
patent: A-10-512399 (1998-11-01), None
patent: A-2000-323515 (2000-11-01), None
patent: WO 97/12394 (1996-09-01), None
U.S. Appl. No. 10/327,968, filed Dec. 26, 2002, Tomimatsu.
U.S. Appl. No. 10/347,297, filed Jan. 21, 2003, Takahashi.
U.S. Appl. No. 10/347,600, filed Jan. 21, 2003, Takahashi et al.
Louie Wai-Sing
Oliff & Berridg,e PLC
Pham Long
Seiko Epson Corporation
LandOfFree
Method for forming bump, semiconductor element having bumps... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for forming bump, semiconductor element having bumps..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming bump, semiconductor element having bumps... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3444947