Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-10-04
2005-10-04
Thornton, Yvette C. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S905000, C430S910000, C562S030000, C562S041000, C562S045000, C562S056000
Reexamination Certificate
active
06951706
ABSTRACT:
The present invention provides a sulfonate of the formula (I):wherein Q1, Q2, Q3, Q4and Q5each independently represent hydrogen, alkyl having 1 to 16 carbon atoms, alkoxy having 1 to 16 carbon atoms, halogen, aryl having 6 to 12 carbon atoms, aralkyl having 7 to 12 carbon atoms, cyano, sulfide, hydroxy, nitro or a group of the formula (I′)in-line-formulae description="In-line Formulae" end="lead"?—COO—X—Cy1 (I′)in-line-formulae description="In-line Formulae" end="tail"?wherein X represents alkylene and at least one —CH2— in the alkylene may be substituted by —O— or —S—, and Cy1represents alicyclic hydrocarbon having 3 to 20 carbon atoms,and A+represents a counter ion, with the proviso that at least one of Q1, Q2, Q3, Q4and Q5is the group of the formula (I′).The present invention also provides a chemical amplification type positive resist composition comprising a sulfonate of the formula (I) and resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.
REFERENCES:
patent: 5837420 (1998-11-01), Aoai et al.
patent: 2003/0068573 (2003-04-01), Takata et al.
patent: 2004/0018445 (2004-01-01), Akita et al.
Moriuma Hiroshi
Uetani Yasunori
Yamaguchi Satoshi
Sumitomo Chemical Company Limited
Thornton Yvette C.
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