Power switching transistor with low drain to gate capacitance

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S342000

Reexamination Certificate

active

06870221

ABSTRACT:
A transistor (10) is formed on a semiconductor substrate (12) with a first surface (19) for forming a channel (40). A gate dielectric (22) has a first thickness overlying a first portion of the channel, and a dielectric film (20) overlies a second portion of the channel and has a second thickness greater than the first thickness. The second thickness reduces the drain to gate capacitance of the transistor, thereby improving its switching speed and frequency response.

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patent: 0050773 (1981-09-01), None
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patent: 0119400 (1984-09-01), None

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