Thermal processing apparatus for substrate employing...

Details Thermal processing apparatus for substrate employing... Thermal processing apparatus for substrate employing...

2005-01-18

2005-01-18

Nelms, David (Department: 2818)

Coating apparatus

Gas or vapor deposition

Chamber seal

C118S722000, C118S724000, C118S725000, C356S043000, C356S044000, C356S045000, C356S046000, C356S047000, C356S048000

Reexamination Certificate

active

06843202

ABSTRACT:
A lamp house storing a plurality of flash lamps and a chamber storing and holding a semiconductor wafer are fitted to each other in an openable/closable manner. The lamp house and the chamber are fixed to a closed state with male screws. In order to process a semiconductor wafer, a shutter plate is drawn out to open an irradiation window. In this state, the shutter plate shields a space located above the male screws so that the male screws cannot be detached for opening the lamp house and the chamber. In order to open the lamp house and the chamber, the shutter plate must be inserted for shielding the irradiation window while opening the space located above the male screws. Thus, a thermal processing apparatus capable of preventing the lamps from breaking during maintenance thereof is provided.

REFERENCES:
patent: 4525380 (1985-06-01), Arai et al.
patent: 4567352 (1986-01-01), Mimura et al.
patent: 4958061 (1990-09-01), Wakabayashi et al.
patent: 6630991 (2003-10-01), Kitamura et al.
patent: 59-169125 (1984-09-01), None
patent: 63-166219 (1988-07-01), None
patent: 02-005294 (1990-02-01), None
patent: 02-077119 (1990-03-01), None
English translation of portion of Japanese Patent Application Laid-Open No. 63-166219 relevant to the instant application.

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