Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2005-01-04
2005-01-04
Quach, T. N. (Department: 2814)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S326000, C257S532000, C257S758000
Reexamination Certificate
active
06838721
ABSTRACT:
An integrated circuit (101) includes electrical circuitry (105) formed on a substrate (103). An interconnect layer (109, 117) is formed over the electrical circuitry (105). In one example, a plurality of magneto-resistive random access memory cells (MRAM) (161, 171) is implemented above the interconnect layer. Each of the MRAM cells comprises a magneto-resistive tunnel junction (MTJ) storage element. A transistor (130) is formed-over the interconnect layer (109, 117). In one embodiment, the transistor is implemented as a thin film transistor (TFT). In one embodiment the transistor is a select transistor and may be coupled to one or more of the MTJ storage elements. Access circuitry (203, 205, 207, 209) is formed on the substrate (103) under the plurality of MRAM cells (161, 171).
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Garni Bradley J.
Pelley III Perry H.
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