Structure and method for preventing UV radiation damage in a...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C438S780000

Reexamination Certificate

active

06894342

ABSTRACT:
According to one exemplary embodiment, a structure comprises a substrate. The structure further comprises at least one memory cell situated on the substrate. The at least one memory cell may be, for example, a SONOS flash memory cell. The structure further comprises an interlayer dielectric layer situated over at least one memory cell and over the substrate. The structure further comprises a first antireflective coating layer situated over the interlayer dielectric layer. According to this exemplary embodiment, the structure further comprises a second antireflective coating layer situated directly over the first anti reflective coating layer. Either the first antireflective coating layer or second antireflective coating layer must be a silicon-rich layer. The first antireflective coating layer and the second antireflective coating may form a UV radiation blocking layer having a UV transparency less than approximately 1.0 percent, for example.

REFERENCES:
patent: 5721167 (1998-02-01), Subramanian et al.
patent: 5985517 (1999-11-01), Tanaka et al.
patent: 6410210 (2002-06-01), Gabriel
patent: 6548423 (2003-04-01), Plat et al.

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