Optical: systems and elements – Lens – With reflecting element
Reexamination Certificate
2005-09-13
2005-09-13
Sugarman, Scott J. (Department: 2873)
Optical: systems and elements
Lens
With reflecting element
C359S555000
Reexamination Certificate
active
06943965
ABSTRACT:
In a method for correcting oscillation-induced imaging errors in an objective, in particular a projection objective in microlithography for fabricating semiconductor elements, an at least first objective part and a second objective part are provided. In this case, the first objective part has a first optical axis and the second objective part has an optical axis which deviates from the first optical axis. Beam deflection takes place between the two objective parts via at least one optical beam deflection element. The oscillations occurring in the second objective part are measured and evaluated by means of a sensor system. The results are used as input data for a device, which adjusts the beam direction in the objective, in such a way that imaging errors occurring as a result of the oscillations of the second objective part are compensated for.
REFERENCES:
patent: 5680200 (1997-10-01), Sugaya et al.
patent: 5959769 (1999-09-01), Yoneyama
patent: 6191407 (2001-02-01), Cooper
Holderer Hubert
Kohl Alexander
Carl Zeiss SMT AG
Sugarman Scott J.
Welsh & Katz Ltd.
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