Etching a substrate: processes – Etching of semiconductor material to produce an article...
Reexamination Certificate
2005-01-11
2005-01-11
Alanko, Anita (Department: 1765)
Etching a substrate: processes
Etching of semiconductor material to produce an article...
C216S011000, C216S099000, C427S255600, C427S582000, C427S585000, C427S301000, C427S309000
Reexamination Certificate
active
06841079
ABSTRACT:
Silicon substrates having Si—H bonds are chemically modified using a fluorinated olefin having the formula:whereinm is an integer greater than or equal to 1;n is an integer greater than or equal to 0;Z is a divalent linking group; andRfis a highly fluorinated organic group.
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Boardman Larry D.
Dunbar Timothy D.
Elsbernd Cheryl L.
Guerra Miguel A.
Moore George G.
3M Innovative Properties Company
Alanko Anita
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