Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2005-03-15
2005-03-15
Nelms, David (Department: 2818)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257SE27104
Reexamination Certificate
active
06867446
ABSTRACT:
In a semiconductor memory device having a capacitor layer comprising a dielectric film or a ferroelectric film, as an interlayer insulation film formed between the capacitor and a wiring layer formed at the upper part thereof or an insulation film which covers the wiring layer, a multilayered film is used which consists of a first insulation film and a second insulation film laid upon the other; the former being a lower layer and being formed of an organic film, and the latter being an upper layer and being formed of a hard-mask material. This makes it possible to prevent thin film comprised of a dielectric material or a ferroelectric material from any deterioration caused by the hydrogen and water contained in the interlayer insulation film and passivation film of the semiconductor memory device and also by the stress of these films.
REFERENCES:
patent: 5976928 (1999-11-01), Kirlin et al.
patent: 7-273297 (1995-10-01), None
patent: 11-126883 (1999-05-01), None
patent: 2000-164817 (2000-06-01), None
Ogata Kiyoshi
Otani Miharu
Suenaga Kazufumi
Tanaka Jun
Ho Tu-Tu
Mattingly Stanger & Malur, P.C.
Renesas Technology Corp.
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