Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

2005-04-05

2005-04-05

Vu, David (Department: 2828)

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

C315S111410, C313S231310

Reexamination Certificate

active

06876154

ABSTRACT:
This invention relates to plasma processing apparatus and in particular, but not exclusively, to inductively coupled plasma helicon or electron cyclotron resonance apparatus. A plasma generation chamber is sat above a process chamber, in which is located a workpiece support. A plasma generation or source region exists and coils are provided to create magnetic mirrors above and below the plasma generation zone, whereby electrons will be reflected back towards the plasma zone and there is no electrical conductive path extending around or through at least the upper mirror.

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