Ferroelectric memory device and method of manufacturing the...

Static information storage and retrieval – Systems using particular element – Ferroelectric

Reexamination Certificate

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C365S149000

Reexamination Certificate

active

06922351

ABSTRACT:
A ferroelectric memory device includes first electrodes, second electrodes arranged in a direction which intersects the first electrodes, and ferroelectric films disposed in at least intersecting regions of the first electrodes and the second electrodes. Capacitors formed of the first electrodes, the ferroelectric films, and the second electrodes are disposed in a matrix. A ferroelectric phase and a paraelectric phase are mixed in each of the ferroelectric films.

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Extended Abstracts (The 48thSpring Meeting, 2001); The Japan Society of Applied Physics and Related Societies, Mar. 28, 2001, p. 535.
Xusheng Wang et al., “Structural and Electrical Properties of Ferroelectric Pb(Zr1-xTix)O3-SiO2Glass-Ceramic Thin Films Derived by the Sol-Gel Method,” Japanese Journal of Applied Physics, vol. 40, Part 1, No. 3A, Mar. 2001, pp. 1401-1407.
Xusheng Wang et al., “Sol-Gel Derived Ferroelectric Pb(Zr1-xTix)O3-SiO2-B2O3Glass-Ceramic Thin Films Formed at Relatively Low Annealing Temperatures,” Japanese Journal of Applied Physics, vol. 40, Part 1, No. 9B, Sep. 2001, pp. 5547-5550.
Takeshi Kijima et al., “Preparation of Bi4Ti3O12Thin Films on Si(100) Substrate Using Bi2SiO5Buffer Layer and its Electric Characterization,” Japanese Journal of Applied Physics, vol. 37, Part 1, No. 9B, Sep. 1998, pp. 5171-5173.

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