Method and apparatus for fabrication of passivated...

Details Method and apparatus for fabrication of passivated... Method and apparatus for fabrication of passivated...

2005-04-12

2005-04-12

Guerrero, Maria F. (Department: 2822)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Physical stress responsive

C438S795000, C438S799000, C438S308000, C438S940000, C438S958000

Reexamination Certificate

active

06878567

ABSTRACT:
A method and apparatus for fabrication of passivated microfluidic structures is disclosed. The method includes providing a substrate having a microfluidic structure formed therein. The microfluidic structure is embedded by an embedding layer. The method further includes passivating the embedded microfluidic structure by locally heating the microfluidic structure surface in a reactive atmosphere, wherein the passivated microfluidic structure is suitable for transporting a fluid.

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T.M. Bloomstein et al. “Laser deposition and etching of three-dimensional microstructure”, May 1991, IEEE, pp. 507-511.

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