Method of enhancing adhesion strength of BSG film to silicon...

Details Method of enhancing adhesion strength of BSG film to silicon... Method of enhancing adhesion strength of BSG film to silicon...

2005-03-01

2005-03-01

Padgett, Marianne (Department: 1762)

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

C427S579000, C427S255180, C427S255270, C427S255370, C427S255393, C427S255394, C438S791000, C438S792000, C438S763000, C438S771000, C438S719000, C438S723000, C438S724000

Reexamination Certificate

active

06861104

ABSTRACT:
A method of enhancing adhesion strength of a boro-silicate glass (BSG) film to a silicon nitride film is provided. A semiconductor substrate with a silicon nitride film formed thereon is provided. The silicon nitride film is then exposed to oxygen-containing plasma such as ozone plasma. A thick BSG film is then deposited onto the treated surface of the silicon nitride film. By pre-treating the silicon nitride film with ozone plasma for about 60 seconds, an increase of near 50% of Kapp of the BSG film is obtained.

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