Semiconductor device including junction diode contacting...

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Passive components in ics

Reexamination Certificate

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C257S050000, C257S529000

Reexamination Certificate

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06946719

ABSTRACT:
The invention provides for a vertically oriented junction diode having a contact-antifuse unit in contact with one of its electrodes. The contact-antifuse unit is formed either above or below the junction diode, and comprises a silicide with a dielectric antifuse layer formed on and in contact with it. In preferred embodiments, the silicide is cobalt silicide, and the antifuse preferably silicon oxide, silicon nitride, or silicon oxynitride grown on the colbalt silicide. The junction diode and contact-antifuse unit can be used as a memory cell, which is advantageously used in a monolithic three dimensional memory array.

REFERENCES:
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patent: 6420215 (2002-07-01), Knall et al.
patent: 6525953 (2003-02-01), Johnson
patent: 6541312 (2003-04-01), Cleeves et al.
U.S. Appl. No. 10/185,507, filed Jun. 27, 2002, Vyvoda et al.
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U.S. Appl. No. 10/610,804, filed Jun. 30, 2003, Herner et al.
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Herner, S..B. ,et al. ,“Polycrystalline silicon/CoSi2 Schottky diode with integrated SiO2 antifuse: a nonvolatile memory cell”,Applied Physics Letters,vol. 82, No. 23, Jun. 9, 2003, 4163-4165.
Konakova, R..V. ,et al. ,“Ohmic Contacts for Microwave Diodes”,Proc. 22nd International Conference on Microelectronics(MIEL 2000), vol. 2, NIS, Serbia, May 14-17, 2000, (Jan. 1999), 477-480.
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