Method and apparatus for providing rotational burn-in stress...

Electricity: measuring and testing – Fault detecting in electric circuits and of electric components – Of individual circuit component or element

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C324S1540PB

Reexamination Certificate

active

06683467

ABSTRACT:

FIELD
The present invention relates to semiconductor integrated circuit testing and more particularly relates to burn-in testing of semiconductor integrated circuit devices.
BACKGROUND
After semiconductor devices are produced, a screening and testing operation may be performed to detect and remove defective electronic devices to ensure the overall quality of the devices. In one such screening operation, a burn-in stress test may be executed that involves both field acceleration and temperature acceleration. During burn-in stress testing, the device may be operated in a state where the voltage and temperature of the test are set much higher than the normal operating voltage and temperature of the device. A stress voltage higher than that which frequently causes initial failure during normal operation may be applied to the device for a period of time. As a result, a defective device may be removed from production. Without burn-in testing, this defective device might have not been detected until the device's initial operation.
The burn-in testing stresses chips through elevation of temperature and voltage and induces weak devices and other structures to fail prior to being released to the field. An objective of stress testing is to identify defective devices at the earliest part of the fabrication process. However, as technology scales, there has been a need to reduce the power supply voltage of chips. Reducing the power supply voltage of chips while maintaining the same threshold voltage for transistors on the chip may degrade the performance of the chip. As such, if the power supply voltage and the threshold voltages are reduced, then leakage current on the chip increases. Leakage current is a major problem that causes a barrier to scaling technology. This problem is more pronounced at burn-in because of the elevated temperature and voltage. It is desirable to deal with burn-in technology without causing leakage current problems in order to screen scaled integrated circuits having increased speeds.


REFERENCES:
patent: 4956602 (1990-09-01), Parrish
patent: 4961053 (1990-10-01), Krug
patent: 5432745 (1995-07-01), Tomita et al.
patent: 5638331 (1997-06-01), Cha et al.
patent: 5656944 (1997-08-01), Choi
patent: 5798653 (1998-08-01), Leung, Jr.
patent: 5804960 (1998-09-01), El Ayat et al.
patent: 5838203 (1998-11-01), Stamoulis et al.
patent: 5949726 (1999-09-01), Tseng et al.
patent: 6229329 (2001-05-01), Nakata et al.
patent: 9935579 (1999-07-01), None
Banikazemi et al., “Comparison and Evaluation of Design Choices for Implementing the Virtual Interface Architecture (VIA)”, Lecture Notes in Computer Science, Springer Verlag, New York, NY, pp. 145-161, vol. 1797, 2000.
Eicken et al., “Evolution of the Virtual Interface Architecture”, Computer, IEEE Computer Society, Long Beach, CA, vol. 31, No. 11, Nov. 1998, pp. 61-68.
Dunning et al., “The Virtual Interface Architecture”, IEEE Micro, IEEE Inc., New York, NY, vol. 18, No. 2, Mar. 1998, pp. 66-76.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for providing rotational burn-in stress... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for providing rotational burn-in stress..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for providing rotational burn-in stress... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3266336

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.