X-ray mask, and exposure apparatus and device production using t

Details X-ray mask, and exposure apparatus and device production using t X-ray mask, and exposure apparatus and device production using t

1994-08-08

1996-01-16

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 35, G21K 500

Patent

active

054854954

ABSTRACT:
A method of producing an X-ray mask includes a step of forming a mask pattern on a mask substrate having an amount of warp, and a step of bonding the mask substrate to a mask frame. In both steps, the mask substrate maintains a shape obtained due to the amount of warp. Since the mask substrate is fixed to the mask frame in a warped state, distortion is not produced in the mask pattern. As a result, an X-ray mask, which is suitable for very precise exposure, is provided.

REFERENCES:
patent: 4881257 (1989-11-01), Nakagawa
patent: 4969168 (1990-11-01), Sakamoto et al.
patent: 5026239 (1991-06-01), Chiba et al.
patent: 5063582 (1991-11-01), Mori et al.
patent: 5150391 (1992-09-01), Ebinuma et al.
patent: 5160961 (1992-11-01), Marumo et al.
patent: 5285488 (1994-02-01), Watanabe et al.

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