Positive-working light-sensitive composition

Details Positive-working light-sensitive composition Positive-working light-sensitive composition

1997-11-12

1999-08-17

Nuzzolillo, M.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302871, 4302881, G03C 173

Patent

active

059392355

ABSTRACT:
A positive-working light-sensitive composition comprising (a) a compound having at least two enol ether groups, represented by the following general formula (I); (b) a linear polymer having acidic groups; and (c) a compound capable of generating an acid through irradiation with actinic light rays or radiant rays, the component (a) and the component (b) being thermally crosslinked:

REFERENCES:
patent: 4247611 (1981-01-01), Sander et al.
patent: 4248957 (1981-02-01), Sander et al.
patent: 5015554 (1991-05-01), Ruckert et al.
patent: 5364738 (1994-11-01), Kondo et al.

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