Thin film semiconductor device including a driver and a matrix c

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer

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438166, 438487, H01L 21336, H01L 2184

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active

058211373

ABSTRACT:
A thin film transistor including a thin semiconductor film which has a central portion as a channel region, with the side portions of the semiconductor film except for the channel region being a source and a drain regions which includes n-type impurities such as phosphorus ions of high concentration (3.times.10.sup.15 atoms/cm.sup.2), and a low concentration region provided between the channel region and each of the source and drain regions including p-type impurities such as boron ions of a low concentration (1.times.10.sup.13 atoms/cm.sup.2) whereby the low concentration region serves to reduce the off current.

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