Functional product

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Patent

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Details

20419212, 20419215, 20419226, 20419227, 20419228, C23C 1434

Patent

active

059388986

ABSTRACT:
A functional product comprising at least one layer of a thin film having a function formed above a substrate; and at least one layer of an oxide film whose major component is an oxide containing tin and silicon, formed above the substrate.

REFERENCES:
patent: 4978437 (1990-12-01), Wirz
patent: 5009761 (1991-04-01), Robinson
patent: 5110637 (1992-05-01), Ando et al.
patent: 5264286 (1993-11-01), Ando et al.
patent: 5399435 (1995-03-01), Ando et al.
J. Vossen et al., "Thin Film Process", Academic Press, 1978, pp. 14-16.

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