Multi-layer susceptor for rapid thermal process reactors

Details Multi-layer susceptor for rapid thermal process reactors Multi-layer susceptor for rapid thermal process reactors

1996-02-02

1998-10-13

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

Work support

118728, 118729, 118500, C23C 1600

Patent

active

058206868

ABSTRACT:
A RTP reactor susceptor is a multi-layer structure. A first layer of the RTP susceptor is a thin layer of preferably silicon carbide, graphite, or silicon carbide coated graphite with a thickness less than about 6 mm, with an emissivity such that the first layer radiates heat, and with thermal heat transfer characteristics such that the first layer facilitates maintaining a substrate or substrates supported by the susceptor at a uniform temperature, and facilitates maintaining uniform process gas characteristics over the substrates. A second layer of the susceptor is transparent to the heat source of the RTP reactor and provides a rigid, stable platform for the first layer.

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