Silver halide photographic light-sensitive material and...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S523000

Reexamination Certificate

active

06544718

ABSTRACT:

BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a silver halide photographic light-sensitive material, and more particularly to a silver halide photographic light-sensitive material for photomechanical plate-making that exhibits ultrahigh-contrast photographic characteristics.
2. Description of the Related Art
In the field of graphic arts, in order to improve the reproduction of continuous-tone images with halftone dot images or the reproduction of line images, image formation systems exhibiting ultrahigh-contrast photographic characteristics (particularly, a &ggr; of 10 or more) are required.
An image formation system capable of obtaining ultrahigh-contrast photographic characteristics by development with a processing solution that has good storage stability has been demanded. To cope with this demand, as described in U.S. Pat. Nos. 4,166,742, 4,168,977, 4,221,857, 4,224,401, 4,243,739, 4,272,606, and 4,311,781, a system for forming an ultrahigh-contrast negative image having a &ggr; value exceeding 10 was proposed. In the system, a surface latent image-type silver halide photographic light-sensitive material, having added thereto a specific acylhydrazine compound, is processed with a developer containing 0.15 mol/L or more of a sulfurous acid preservative and having a pH of from 11.0 to 12.3. This new system is characterized in that silver iodobromide or silver chloroiodobromide can be used, whereas only silver chlorobromide having a high silver chloride content can be used in a conventional ultrahigh-contrast image formation system. Further, the new system is characterized in that it can contain a large amount of sulfurous acid preservative, and relatively good storage stability is achieved, whereas use of only a very small amount of sulfurous acid preservative is allowed in conventional lith developers.
In European Unexamined Patent Publication (EP) 0 208 514A, JP-A-61-223734 (“JP-A” means unexamined published Japanese patent application), and JP-A-63-46437, high-contrast photographic light-sensitive materials containing two types of silver halide grains, and further containing a hydrazine derivative, are described.
JP-A-4-331951 describes, in its claim, a high-contrast light-sensitive material that comprises a hydrazine derivative and silver halide grains that have been subjected to dye sensitization at a higher concentration of a dye per unit surface area of the silver halide grains than other silver halide grains have. Further, British unexamined patent publication (GB-A) 9407599 describes, in its claim, a high-contrast light-sensitive material that comprises silver halide grains spectrally sensitized by a non-desorbable sensitizing dye, and silver halide grains not spectrally sensitized, and further a hydrazine derivative. In both cases, the spectrally sensitized light-sensitive grains and the spectrally unsensitized non-light-sensitive grains contribute to a silver image formed by image-wise exposure and development, due to the presence of the hydrazine derivative, thereby achieving a reduction in the amount of sensitizing dye and an improvement in the residual color, while maintaining both high sensitivity and high density.
Although these light-sensitive materials have excellent processing stability, contrast, sensitivity and residual color, they have the problem that a silver sludge is formed in a processing system which has a low level of developer replenishment.
BRIEF SUMMARY OF THE INVENTION
It is an object of the present invention to provide a silver halide photographic light-sensitive material that does not form a silver sludge even in a processing system which has a low level of developer replenishment. It is another object of the present invention to provide a processing method for continuously processing the above-mentioned silver halide photographic light-sensitive material.
The objects of the present invention have been accomplished as follows.
A first aspect of the present invention relates to a silver halide photographic light-sensitive material including a support having first and second opposing surfaces, at least one light-sensitive silver halide emulsion layer that is provided on the first surface side, and a hydrophilic colloid layer that is provided on the second surface side, wherein the hydrophilic colloid layer contains at least one compound represented by general formula (I) or general formula (II) below.
(In the formulae, X denotes a C
1
to C
6
divalent organic residue, R denotes a carboxylic acid group, a carboxylate salt group, a carboxylate ester group, or a carboxylic amide group, m is 2 or 3, and n is 0 or 1.)
The above-mentioned first surface side is also known as ‘an emulsion layer side’ or ‘an emulsion surface side’ to a person skilled in the art, and the above-mentioned second surface side is also known as ‘a back layer side’ or ‘a back surface’ to a person skilled in the art.
A second aspect of the present invention relates to a method for continuously processing the silver halide photographic light-sensitive material related to the first aspect, wherein the amount of developing solution that is replenished during development is 200 ml or less per m
2
of the light-sensitive material.
The above-mentioned objects, other objects, features, and advantages of the invention will become clear from the following description.


REFERENCES:
patent: 5591567 (1997-01-01), Komatsu et al.
patent: 02055348 (1990-02-01), None
patent: 7-333779 (1995-12-01), None
patent: 11295848 (1999-10-01), None
Chemical Abstract 113:68285.*
Chemical Abstract 131:315790.

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