Method for anisotropic etching in the manufacture of semiconduct

Details Method for anisotropic etching in the manufacture of semiconduct Method for anisotropic etching in the manufacture of semiconduct

1991-07-12

1993-12-21

Hearn, Brian E.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156668, 156662, 250251, 250423R, 250423P, H01L 2100

Patent

active

052718000

ABSTRACT:
Hydrocarbon polymer coatings used in microelectronic manufacturing processes are anisotropically etched by atomic oxygen beams (translational energies of 0.2-20 eV, preferably 1-10 eV). Etching with hyperthermal (kinetic energy>1 eV) oxygen atom species obtains highly anisotropic etching with sharp boundaries between etched and mask-protected areas.

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