Method for plasma jet deposition

Details Method for plasma jet deposition Method for plasma jet deposition

1991-05-10

1994-08-30

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427569, 427249, 427122, 4272585, 423446, 118723E, 118729, 118730, B05D 306

Patent

active

053426606

ABSTRACT:
The disclosure is directed to a method for depositing a substance, such as synthetic diamond. A plasma beam is produced, and contains the constituents of the substance to be deposited. A substrate is provided, and has a surface in the path of the beam, the area of said surface being substantially larger than the cross-sectional area of the beam impinging on the surface. Repetitive motion is introduced between the substrate and the beam as the substance is deposited on the surface. The substrate, the beam, or both can be moved. Spinning of the substrate, with the beam non-concentric thereon, is one of the disclosed techniques.

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