Semiconductor memory circuit

Static information storage and retrieval – Read/write circuit – Testing

Reexamination Certificate

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C365S230060

Reexamination Certificate

active

06392940

ABSTRACT:

BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a semiconductor memory circuit, and particularly to a row address decode circuit for a semiconductor memory circuit.
2. Description of the Related Art
FIG. 9
is a circuit diagram of a memory cell. The memory cell has an NMOS transistor
1
, a capacitor
2
, a word line WLi, and a bit line BLj. As the semiconductor memory circuit has many memory cells, a plurality of word lines WLi(i=1,2,3 . . .) and bit lines BLj are disposed in a matrix pattern. One of the word lines is selected and raised to a predetermined potential during each “data read” or “data write” operation.
To check the reliability of the semiconductor memory circuit, a wafer burn-in test is performed. During the wafer burn-in test, all of the word lines are raised to the predetermined potential at the same time to shorten the time needed to carry out the test.
FIG. 10
is a circuit diagram of a row address decode circuit
1000
which performs the wafer burn-in test, and
FIG. 11
is an operational waveform diagram of the same. This row address decode circuit has a pre-decode circuit
10
, a decode circuit
20
, and a word driver circuit
30
.
The pre-decode circuit
10
has parallel inverters
11
0
~
11
n
, NAND gates
12
0
~
12
n
, and NAND gates
13
0
~
13
n
. Address signals AX
0
~AX
k
, Inverted address signals AX
0b
~AX
kb
, are inputted to the NAND gates
12
0
-
12
n
. Wafer burn-in signal WBI is inputted to the inverters
11
0
~
11
n
. The output signals of the NAND gates
12
0
-
12
n
and the inverters
11
0
-
11
n
are respectively inputted to the NAND gates
13
0
-
13
. This pre-decode circuit
10
outputs pre-decodes signal PAX
0
~PAX
n
of (n+1) bits. Half of k+1 is n+1 in this circuit.
The least significant address signal AX
0
or AX
0b
, which is the inverted signal of AX
0
, is inputted to one input terminal of the NAND gate
12
0
, and second to least significant address signal AX
1
or AX
1b
, which is the inverted signal of AX
1
, is inputted to another input terminal of NAND gate
12
0
. The third to least significant address signal AX
2
or AX
2b
, which is the inverted signal of AX
2
, is inputted to one input terminal of the NAND gate
12
1
, and fourth to least significant address signal AX
3
or AX
3b
, which is the inverted signal of AX
3
, is inputted to another input terminal of NAND gate
12
1
. Input signals are applied to all other NAND gates
12
2
-
12
n
in the same manner as described above. The NAND gates
12
0
~
12
n
output a logic “L” level only when both input signals are a logic “H” level.
When the wafer burn in signal WBI is L level (ground potential), which designates a disable state, the memory circuit operates in a normal mode. Nodes NI
0
~NI
n
are an H level (power supply potential). Therefore, the output signals of NAND gates
13
0
~
13
n
depend on the output signals of NAND gates
12
0
~
12
n
. NAND gates
13
0
~
13
n
output a logic L level when the output signal of NAND gates
12
0
~
12
n
is a logic H level.
When the wafer burn in signal WBI is an H level, which designates an enable state, the memory circuit operates in a burn-in test mode. Nodes NI
0
~NI
n
are L level. Therefore, all of the NAND gates
13
0
~
13
n
output a logic H level.
Decode circuit
20
has a P channel MOS transistor
21
, an N channel MOS transistors
22
0
~
22
n
, and an inverter
23
. Pre-decode signals PAX
0
~PAX
n
and a reset signal PREb are inputted to the decode circuit
20
. The reset signal PREb become an L level when the decode circuit
20
is reset, and the reset signal PREb become an H level when the decode circuit
20
is in an enable state. NMOS transistors
22
0
~
22
n
are connected in series. The source of
22
n
is connected to the ground level. The drain of the NMOS transistor
22
0
is connected to the node ND
0
. Pre-decode signals PAX
0
~PAX
n
are inputted to the gates of transistor
22
0
~
22
n
, respectively. The source of PMOS transistor
21
is connected to the power supply potential, and the drain is connected to the node ND
0
. The reset signal PREb is inputted to the gate of PMOS transistor
21
. The node ND
0
is connected to the input terminal of the inverter
23
. The inverter
23
outputs a decode signal D
0
.
When the decode circuit is reset, reset signal PREb and all of the address signals AX
0
~AX
n
become an L level. Therefore, pre-decode signals PAX

~PAX
n
become an L level. PMOS transistor
21
is in an on state, and the NMOS transistors
22
0
~
22
n
are in off state
20
in this case. The node ND
0
becomes an H level, and the decode signal D
0
becomes an L level.
When the decode line is activated, reset signal PREb becomes an H level. The PMOS transistor
21
is in an off state in this case. Address signals AX
0
~AX
k
are inputted to the pre-decode circuit
10
. Pre-decode circuit
10
outputs pre-decode signals PAX
0
~PAX
n
. If all of the pre-decode signals PAX
0
~PAX
n
are an H level, all of the NMOS transistor
22
0
~
22
n
are in an on state. Therefore, the node ND
0
becomes an L level, and the decode signal D
0
becomes an H level. If one of the pre-decode signals PAX
0
~PAX
n
is an L level, one of the NMOS transistor
22
0
~
22
n
is in an off state. Therefore, the node ND
0
keeps an H level.
When the wafer burn in test is performed, all of the pre-decode signals PAX
0
~PAX
n
become an H level. Therefore, the decode signal D
0
is an H level during the wafer burn in test.
The word driver circuit
30
has an inverter
31
, level shift circuit
32
, PMOS transistor
33
, and NMOS transistor
34
. The level shift circuit changes the amplitude of the input signal. The input signal has an amplitude between the power supply potential and the ground potential. However, to activate a word line, a slightly high level than power supply potential is needed. This level is called the word line activate potential. Therefore, the level shift circuit is needed. The output terminal of the level shift circuit is connected to the gates of PMOS transistor
33
and NMOS transistor
34
. The source of PMOS transistor
33
is connected to the word line activate potential. The source of the NMOS transistor is connected to the ground potential. The drains of transistors
33
and
34
are connected to a word line WLi.
When the decode signal D
0
is an L level, the word driver circuit makes the word line WLi the ground potential. When the decode signal D
0
is an H level, the word driver circuit makes the word line WLi word line an activate potential.
FIG. 10
shows one row address decode circuit. A memory circuit has a plurality of row address decode circuits. For example, address signals inputted to NAND gate
12
0
have four patterns. The first pattern is that the inputted signals are AX
0
and AX
1
. The second pattern is that the inputted signals are AX
0b
and AX
1
. The third pattern is that the inputted signals are AX
0
and AX
1b
. The fourth pattern is that the inputted signals are AX
0b
and AX
1b
. The same relationship applies to other NAND gates
12
1
-
12
n
. Therefore, there are 4
(n+1)
units of row address decode circuits and word lines in a memory circuit.
In the prior art, only the selected word line is activated during the normal mode, and all of the word lines are activated during the wafer burn-in test mode.
While the wafer burn in test is performed, there is not any electrical potential difference between the word lines. However, in the normal operation, there are electrical potential differences between the word lines. Therefore, the wafer burn-in test in the prior art can not test for the stress between word lines.
SUMMARY OF THE INVENTION
An object of the present invention is to provide a semiconductor memory device which allows stress acceleration testing between word lines.
A memory circuit includes a plurality of word lines connected to a plurality of memory cells and a plurality of row address decode circuits which selectively activate the plurality of word lines, respectively, and each having at least one addre

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