Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Reexamination Certificate
2008-03-25
2008-03-25
Geyer, Scott B. (Department: 2812)
Semiconductor device manufacturing: process
Chemical etching
Combined with coating step
C257SE21267
Reexamination Certificate
active
07348278
ABSTRACT:
A method of making a nitride-based compound semiconductor crystal has the step of growing a nitride-based compound semiconductor crystal with a predetermined thickness by using a nitride-based compound semiconductor substrate as a seed crystal. The nitride-based compound semiconductor substrate as the seed crystal is polished at both surfaces thereof.
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Foley & Lardner LLP
Geyer Scott B.
Hitachi Cable Ltd.
Ullah Elias
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