Support system for a treatment apparatus

Details Support system for a treatment apparatus Support system for a treatment apparatus

2008-06-17

2008-06-17

MacArthur, Sylvia R. (Department: 1792)

Coating apparatus

Gas or vapor deposition

Work support

C156S345550

Reexamination Certificate

active

07387687

ABSTRACT:
A system for an apparatus of the type adapted to treat substrates and/or wafers is described and comprises a stationary base element and a movable support for at least one substrate or at least one wafer, the support being rotatable above the element about a stationary axis; a chamber, and at least one duct is provided for the admission of at least one gas-flow to the chamber in order to raise the support; the system also comprises means for converting the flow of gas into the chamber into rotation of the support.

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U.S. Appl. No. 10/538,529 Response filed Jan. 28, 2008 to Non Final Office Action mailed Sep. 6, 2007, 10 pgs.
U.S. Appl. No. 10/538,416 Response filed Jan. 31, 2008 to Non Final Office Action mailed Oct. 10, 2007, 9 pgs.
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“U.S. Appl. No. 10/538,416 Non Final Office Action mailed Oct. 10, 2007,” 9 pgs.

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