Method of manufacturing an AMOLED

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer

Reexamination Certificate

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Details

C438S082000, C438S099000, C438S151000, C257SE21561

Reexamination Certificate

active

07381596

ABSTRACT:
The present invention relating to a method of manufacturing an AMOLED panel. The method comprises providing a substrate, forming a TFT on the substrate, forming an inter-layer insulator layer, forming a plurality of via holes, forming a metal layer which electrically contacts a source and a drain, forming a transparent electrode, a pixel define layer and a LED. Because the present invention omits a passivation layer, the cost decreases and the process is simpler.

REFERENCES:
patent: 2001/0055828 (2001-12-01), Kaneko et al.
patent: 2003/0127650 (2003-07-01), Park
patent: 2004/0079945 (2004-04-01), Weaver et al.
patent: 2004/0191566 (2004-09-01), Kikuchi et al.
patent: 2004/0235224 (2004-11-01), Lin
patent: 2006/0001091 (2006-01-01), Kim
patent: 2006/0043373 (2006-03-01), Wu et al.
patent: 2006/0146217 (2006-07-01), Ahn
patent: 2007/0029545 (2007-02-01), Striakhilev et al.
patent: 1238020 (2005-08-01), None

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