Method for fabricating microelectromechanical system (MEMS)...

Metal working – Method of mechanical manufacture – Electrical device making

Reexamination Certificate

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C029S825000, C029S830000, C361S277000, C361S278000, C361S280000, C361S281000, C438S689000, C438S694000, C438S697000, C216S011000, C216S033000, C216S036000, C216S080000

Reexamination Certificate

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07346981

ABSTRACT:
A process for fabricating a MEMS device comprises the steps of depositing and patterning on one side of a wafer a layer of material having a preselected electrical resistivity; bonding a substrate to the one side of the wafer using an adhesive bonding agent, the substrate overlying the patterned layer of material; selectively removing portions of the wafer from the side opposite the one side to define stationary and movable MEMS elements; and selectively removing the adhesive bonding agent to release the movable MEMS element, at least a portion of the layer of material being disposed so as to be attached to the movable MEMS element.

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patent: 6756310 (2004-06-01), Kretschmann et al.
patent: 6768628 (2004-07-01), Harris et al.

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