Method and apparatus for circuit pattern inspection

Image analysis – Pattern recognition – Feature extraction

Reexamination Certificate

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Details

C356S237200, C250S559360, C348S128000

Reexamination Certificate

active

07369703

ABSTRACT:
A system for measuring a pattern on a sample, including: a data processing system that processes a set of two-dimensional distribution data of intensities from the sample, to calculate: a set of edge points indicative of position of edges of the pattern in a two-dimensional plane from the two-dimensional distribution data; an approximation edge indicative of the edge of the pattern; an edge fluctuation data by calculating a difference between the set of edge points and the approximation edge; and a correlation between a first portion of the edge fluctuation data and a second portion of the edge fluctuation data.

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J. Vac. Sci. Technol. B16(6), Nov./Dec. 1998, p. 3739-3743.
IEEE Electron Device Letters, vol. 22, No. 6, Jun. 2001, p. 287-289.

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