Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Reexamination Certificate
2008-05-06
2008-05-06
Tran, Thuy Vinh (Department: 2821)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
C315S111110
Reexamination Certificate
active
07368876
ABSTRACT:
A low-cost plasma processing apparatus which permits reduction of the cost, as well as reduction of the loss of transmitted power. The plasma processing apparatus1has an apparatus main body2and auxiliary equipment3. The auxiliary equipment3is comprised of a power supply apparatus5that supplies power to a processing chamber4, and a plurality of dry pumps6and7, and so on. The power supply apparatus5is comprised of a matching unit9, an RF amplifier13that is connected to the matching unit9via a coaxial cable24, and a power controller12having a DC amplifier14therein. The RF amplifier13is formed in a separate body to the DC amplifier14and disposed in a position away from the DC amplifier14and close to the matching unit9, and is connected to the DC amplifier14via an ordinary cable25.
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Hayami Toshihiro
Ito Etsuji
Sakai Itsuko
Kabushiki Kaisha Toshiba
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Tokyo Electron Limited
Tran Thuy Vinh
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