Semiconductor memory device having ferroelectric capacitors...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S532000, C257S636000, C257SE21663, C257SE21664, C438S003000

Reexamination Certificate

active

07400005

ABSTRACT:
A semiconductor memory device, which prevents the penetration of hydrogen or moisture to a ferroelectric capacitor from its surrounding area including a contact plug portion, comprises a ferroelectric capacitor formed above a semiconductor substrate, a first hydrogen barrier film formed on an upper surface of the ferroelectric capacitor to work as a mask in the formation of the ferroelectric capacitor, a second hydrogen barrier film formed on the upper surface and a side face of the ferroelectric capacitor including on the first hydrogen barrier film, and a contact plug disposed through the first and second hydrogen barrier films, and connected to an upper electrode of the ferroelectric capacitor, a side face thereof being surrounded with the hydrogen barrier films.

REFERENCES:
patent: 6982444 (2006-01-01), Kanaya et al.
patent: 7001821 (2006-02-01), Aggarwal et al.
patent: 2002/0006674 (2002-01-01), Ma et al.
patent: 2005/0012126 (2005-01-01), Udayakumar et al.
patent: 2003-51582 (2003-02-01), None
patent: 2003-68987 (2003-03-01), None
U.S. Appl. No. 11/142,441, filed Jun. 2, 2005, Kumura et al.
U.S. Appl. No. 11/288,204, filed Nov. 29, 2005, Kumura et al.
U.S. Appl. No. 11/276,781, filed Mar. 14, 2006, Kanaya.

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