Semiconductor device having recess gate

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S283000, C257S284000, C257S332000, C257S333000, C257SE29200, C257SE21429

Reexamination Certificate

active

07898025

ABSTRACT:
A semiconductor device having a recess gate includes a semiconductor substrate having a recess, a conductive pattern for a gate electrode filled into the recess, and having an extension portion protruding higher than a surface of the semiconductor substrate, an epitaxial semiconductor layer having a top surface disposed over the semiconductor substrate, and a gate insulating layer disposed between the epitaxial semiconductor layer and the conductive pattern, and between the semiconductor substrate and the conductive pattern. Further, a method of fabricating the same is disclosed.

REFERENCES:
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patent: 6677205 (2004-01-01), Beintner
patent: 2004/0124461 (2004-07-01), Gajda
patent: 2005/0001266 (2005-01-01), Kim
patent: 2005/0020086 (2005-01-01), Kim et al.
patent: 2006/0006410 (2006-01-01), Lee et al.
patent: 1794467 (2006-06-01), None
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patent: 1020050119244 (2005-12-01), None
patent: 441022 (2001-06-01), None
patent: 495859 (2002-07-01), None
patent: 536746 (2003-06-01), None
Notice of Allowance for Korean Application 10-2006-0124735.
Chinese Office Action for corresponding Chinese patent application 200710096999.4.
Office Action together with Search Report dated Oct. 27, 2009, for Taiwanese application No. 95149448, citing the above references.
Chinese Patent Certificate and Publication of application No. 200710096999.4, citing the above refernce(s).

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