Nitride light emitting device and manufacturing method thereof

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – With housing or contact structure

Reexamination Certificate

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C257SE33064

Reexamination Certificate

active

07372081

ABSTRACT:
A nitride LED having a laminated structure in which a substrate, a n-type cladding layer, an active layer, a p-type cladding layer, and a multi-ohmic contact layer are sequentially stacked, and a manufacturing method thereof, are provided. In the nitride LED, the multi-ohmic contact layer includes multiple layers of a first transparent film layer/silver/second transparent film layer. In the nitride LED and a manufacturing method thereof, ohmic contact characteristics with respect to the p-type cladding layer are enhanced, thereby exhibiting a good current-voltage characteristic. Also, since the transparent electrodes have a high light transmitting property, the light emitting efficiency of the device is increased.

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Chinese Office Action dated Aug. 3, 2007 with English language translation.
ITO/Ag/ITO multilayer films for the application of a very low resistance transparent electrode; K.H.Choi, J.Y. Kim, Y.S. Lee, H.J. Kim, Thin Solid Fils 341 (1999) 152-155.

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