Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2008-05-27
2008-05-27
Chu, John S. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S330000, C430S905000, C430S910000
Reexamination Certificate
active
07378218
ABSTRACT:
A fluorinated polymer comprising recurring units of formulae (1a) to (1d) and having a Mw of 1,000-500,000 is provided. R1is an acid labile group, R2is a single bond or methylene, a1, a2, a3, and a4 are numbers from more than 0 to less than 1, and 0<a1+a2+a3+a4≦1, b is 1 or 2, and c is 0 or 1. A resist composition comprising the polymer, when processed by the lithography involving ArF exposure, has many advantages including resolution, line edge roughness, etch resistance
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Endo Masayuki
Harada Yuji
Hatakeyama Jun
Kawai Yoshio
Komoriya Haruhiko
Birch & Stewart Kolasch & Birch, LLP
Central Glass Co. Ltd.
Chu John S.
Matsushita Electric - Industrial Co., Ltd.
Shin-Etsu Chemical Co. , Ltd.
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