Optical proximity correction using chamfers and rounding at...

Details Optical proximity correction using chamfers and rounding at... Optical proximity correction using chamfers and rounding at...

2008-04-08

2008-04-08

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Methods

C355S053000, C430S005000

Reexamination Certificate

active

07355681

ABSTRACT:
Disclosed is a method of optimizing a design to be formed on a substrate. The method includes approximating rounding of at least one corner of an image of the design; generating a representation of the design further to the approximate rounding of the at least one corner; generating an initial representation of a mask utilized to image the design based on the representation; and performing Optical Proximity Correction (OPC) further to the initial representation of the mask.

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U.S. Appl. No. 60/557,833, filed Mar. 30, 2004.

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