Substrate scanner apparatus

Radiant energy – Means to align or position an object relative to a source or...

Reexamination Certificate

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Details

C250S492100, C250S526000, C250S522100

Reexamination Certificate

active

07994486

ABSTRACT:
This invention relates to an apparatus for scanning substrates through an ion beam in the process chamber of an ion implanter. The apparatus comprises a substrate carriage and reaction mass carriage movably mounted to a fixed base. The substrate carriage is adapted to support a substrate holder. Movement of the substrate carriage results in movement of the substrate holder, and substrate mounted therein, through the ion beam. The reaction mass carriage moves in the opposite direction to the substrate carriage to counter any reaction forces exerted on the fixed base as a result of acceleration of the substrate carriage.

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patent: 6603531 (2003-08-01), Binnard
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patent: 2003/0202167 (2003-10-01), Binnard
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patent: 2003/0218732 (2003-11-01), Watson et al.
patent: 2004/0046947 (2004-03-01), Yuan et al.
patent: 2004/0051854 (2004-03-01), Tanaka et al.
patent: 2004/0130220 (2004-07-01), Hazelton
patent: 2004/0194565 (2004-10-01), Okada et al.
patent: 2005/0232748 (2005-10-01), Vanderpot et al.
patent: 03021894 (1991-01-01), None
patent: 03021894 (1991-01-01), None
patent: 03107639 (1991-05-01), None
patent: 030107639 (1991-05-01), None
English Abstract of JP03021894.
English Abstract of JP030107639.

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