Method and system for advanced process control using a...

Details Method and system for advanced process control using a... Method and system for advanced process control using a...

2011-01-11

2011-01-11

Kasenge, Charles R (Department: 2121)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S108000, C700S121000, C702S084000

Reexamination Certificate

active

07869894

ABSTRACT:
By directly using relative biases, contained in the relative bias date matrix, and by appropriately weighting the components thereof, sampling rate limitations in an APC control scheme may be efficiently compensated for. In particular embodiments, an age-based weighting factor is established that scales measurement data uncertainty according to the delay with which the corresponding measurement data for a specific control thread are obtained.

REFERENCES:
patent: 6161054 (2000-12-01), Rosenthal et al.
patent: 6248602 (2001-06-01), Bode et al.
patent: 6333786 (2001-12-01), Uzawa et al.
patent: 6346426 (2002-02-01), Toprac et al.
patent: 6615101 (2003-09-01), Nicholson et al.
patent: 6640151 (2003-10-01), Somekh et al.
patent: 6654698 (2003-11-01), Nulman
patent: 6675135 (2004-01-01), Murray et al.
patent: 6738682 (2004-05-01), Pasadyn
patent: 6757579 (2004-06-01), Pasadyn
patent: 6836691 (2004-12-01), Stirton
patent: 6898471 (2005-05-01), Sun et al.
patent: 6928628 (2005-08-01), Seligson et al.
patent: 6988017 (2006-01-01), Pasadyn et al.
patent: 7127304 (2006-10-01), Gould et al.
patent: 7127316 (2006-10-01), Hsu et al.
patent: 7180443 (2007-02-01), Mookerjee et al.
patent: 7181354 (2007-02-01), Bone et al
patent: 7289864 (2007-10-01), Horak et al.
patent: 7349753 (2008-03-01), Paik
patent: 7689028 (2010-03-01), Sakano et al.
patent: 7738986 (2010-06-01), Stirton et al.
patent: 2005/0071039 (2005-03-01), Mitrovic
patent: 2006/0015206 (2006-01-01), Funk et al.
patent: 2006/0129257 (2006-06-01), Chen et al.
patent: 2006/0184264 (2006-08-01), Willis et al.
patent: 2007/0005172 (2007-01-01), Malig et al.
patent: 2007/0238201 (2007-10-01), Funk et al.
patent: 199 02 795 (2000-08-01), None
patent: 102 19 363 (2003-11-01), None
patent: 698 11 742 (2003-12-01), None
patent: 1 420 314 (2003-11-01), None
patent: WO 03/023538 (2003-03-01), None
Office Action dated Aug. 22, 2008 from related U.S. Appl. No. 11/539,803.
Letter dated Jan. 25, 2010 from Grunecker Kinkeldey Stockmair & Schwanhäusser.
Edgar et al., “Model-Based Control in Microelectronic Manufacturing,” Dec. 1999, IEEE, pp. 4185-4191.
Qin et al., “Semiconductor Manufacturing Process Control and Monitoring: A Fab-Wide Framework,” Jun. 2, 2005, Elseviee, pp. 179-191.
Smith et al., “Run by Run Advanced Process Control of Metal Sputter Deposition,” May 1998, IEEE, vol. 11, No. 2, pp. 276-284.
Ciccarella et al., “Multiple Processor Architectures for Real Time Parameter Estimation,” 1989, IEEE, pp. 93-100.
van der Veen, “Error analysis in the evaluation of measurement uncertainty,” Apr. 1, 2003, IOPscience, pp. 42-50.
Final Office Action from related U.S. Appl. No. 11/382,112 dated Mar. 30, 2010.

Affiliated with

Also associated with

Rating

Method and system for advanced process control using a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and system for advanced process control using a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for advanced process control using a... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2723045