Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2011-01-25
2011-01-25
Le, Thao X (Department: 2892)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S328000, C257S342000, C257S339000, C438S140000, C438S454000
Reexamination Certificate
active
07875930
ABSTRACT:
The invention provides a semiconductor structure. A first type body doped region is deposited on a first type substrate. A first type heavily-doped region having a finger portion with an enlarged end region is deposited on the first type body doped region. A second type well region is deposited on the first type substrate. A second type heavily-doped region is deposited on the second type well region. An isolation structure is deposited between the first type heavily-doped region and the second type heavily-doped region. A gate structure is deposited on the first type substrate between the first type heavily-doped region and the isolation structure.
REFERENCES:
patent: 5633521 (1997-05-01), Koishikawa
patent: 6084277 (2000-07-01), Disney et al.
patent: 7115958 (2006-10-01), Disney et al.
patent: 2004/0178443 (2004-09-01), Hossain et al.
patent: 2009/0020814 (2009-01-01), Choi et al.
Le Thao X
Tran Thanh Y
Vanguard International Semiconductor Corporation
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