Coating apparatus – Gas or vapor deposition – Multizone chamber
Reexamination Certificate
2011-08-09
2011-08-09
Zervigon, Rudy (Department: 1716)
Coating apparatus
Gas or vapor deposition
Multizone chamber
C156S345310, C156S345540
Reexamination Certificate
active
07993457
ABSTRACT:
An apparatus and method for depositing film on a substrate includes a plurality of conduits that allow by-product and reactant gases to flow past the edge of a substrate. The apparatus and process of the present invention has several advantages for enhanced chamber performance, particularly for micro-volume chambers using pulsed deposition layer processes.
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Krotov Peter
Smith Colin F.
Novellus Systems Inc.
Weaver Austin Villeneuve & Sampson LLP
Zervigon Rudy
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