Coating compositions comprising a latent activator for...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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Details

C430S007000, C430S905000, C430S944000, C430S945000, C430S964000

Reexamination Certificate

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07998653

ABSTRACT:
The present invention provides a composition, which comprises a latent activator. It also provides a process for the preparation of these compositions, substrates coated with these compositions and a process for their preparation, a process for preparing marked substrates using these compositions and marked substrates obtainable by the latter process.

REFERENCES:
patent: 3955987 (1976-05-01), Schaar et al.
patent: 4241144 (1980-12-01), Hendy
patent: 5413629 (1995-05-01), Yasui et al.
patent: 5560769 (1996-10-01), Conner et al.
patent: 5897938 (1999-04-01), Shinmoto et al.
patent: 6057380 (2000-05-01), Birbaum et al.
patent: 6210472 (2001-04-01), Kwan et al.
patent: 7144676 (2006-12-01), Barr et al.
patent: 2007/0054220 (2007-03-01), Heneghan
patent: 2042858 (1991-11-01), None
patent: 458502 (1991-11-01), None
patent: 0 600 441 (1994-06-01), None
patent: 600441 (1994-06-01), None
patent: 96/23659 (1996-08-01), None
patent: 00/61377 (2000-10-01), None
patent: 02/100914 (2002-12-01), None

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