Semiconductor device including capacitor element and method...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S331000, C257S332000, C257S334000, C257SE27060

Reexamination Certificate

active

07875927

ABSTRACT:
In a semiconductor device, a memory region and a logic region are provided on one silicon substrate. A trench is provided in the silicon substrate in the memory region, a memory cell transistor is provided in the memory region and a logic transistor is provided in the logic region. The memory cell transistor includes a first gate electrode constituted by a metal material. The first gate electrode is provided to be buried in the trench and to protrude outside of the trench. The logic transistor includes a second gate electrode constituted by same material as the metal material constituting the first gate electrode.

REFERENCES:
patent: 2005/0212038 (2005-09-01), Fujiwaru
patent: 2007/0082440 (2007-04-01), Shiratake
patent: 2007/0096204 (2007-05-01), Shiratake
patent: 2007/0264769 (2007-11-01), Lee et al.
patent: 2008/0227253 (2008-09-01), Ogawa et al.
patent: 2002-261256 (2002-09-01), None
patent: 2005-285980 (2005-10-01), None
patent: 2007-123551 (2007-05-01), None
patent: 2007-134674 (2007-05-01), None

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