Positive resist composition and method of forming resist...

Details Positive resist composition and method of forming resist... Positive resist composition and method of forming resist...

2011-04-05

2011-04-05

Chu, John S (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S910000

Reexamination Certificate

active

07919227

ABSTRACT:
A positive resist composition including a resin component (A) which exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure,the resin component (A) including a structural unit (a1) represented by general formula (I) shown below:wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; R1′represents a hydrogen atom or a lower alkyl group; n represents an integer of 0 to 3; R1represents a lower alkyl group, a fluorine atom, or a fluorinated lower alkyl group; and p represents an integer of 0 to 2.

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International Search Report issued for corresponding PCT Application No. PCT/JP2007/065445, dated Sep. 11, 2007.

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