Chemically amplified positive photosensitive thermosetting...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S325000, C430S330000

Reexamination Certificate

active

07871756

ABSTRACT:
There is provided a photosensitive thermosetting resin composition used for producing a permanent film, capable of forming a resin layer which is excellent in fluidity upon heat bonding after pattern, formation and also has excellent adhesion as well as bonding properties and/or sealing properties. This composition contains a reaction product of (A) an alkali soluble resin and (C) a 10 crosslinking polyvinyl ether compound, (B) a compound generating an acid under irradiation with radiation, and (D) an epoxy resin.

REFERENCES:
patent: 3954475 (1976-05-01), Bonham et al.
patent: 4248957 (1981-02-01), Sander et al.
patent: 4943516 (1990-07-01), Kamayachi et al.
patent: 4994346 (1991-02-01), Meier et al.
patent: 5262280 (1993-11-01), Knudsen et al.
patent: 5527656 (1996-06-01), Imai et al.
patent: 5605941 (1997-02-01), Steinmann et al.
patent: 5876900 (1999-03-01), Watanabe et al.
patent: 5948589 (1999-09-01), Sato et al.
patent: 6004724 (1999-12-01), Yamato et al.
patent: 6309796 (2001-10-01), Nakashima et al.
patent: 2002/0102501 (2002-08-01), Ichikawa et al.
patent: 2004/0009363 (2004-01-01), Shouldice et al.
patent: 0 544 294 (1993-06-01), None
patent: 0 609 684 (1994-08-01), None
patent: 0646580 (1995-04-01), None
patent: 0 702 271 (1995-09-01), None
patent: 58-194834 (1983-11-01), None
patent: H06-148889 (1994-05-01), None
patent: H06-289614 (1994-10-01), None
patent: H6-313134 (1994-11-01), None
patent: H07-134412 (1995-05-01), None
patent: H11-286535 (1999-10-01), None
patent: 2001-27806 (2001-01-01), None
Yamaoka et al, “Dual-mode Behavior of Vinyl Ether Functionalized Photoresist”, Journal of Photopolymer Science and Technology, vol. um 7, No. 3, 1994 pp. 533-536 , no month given.
Ciba “photoinitiator” from http://www.ciba.com/photoinitiator printed Mar. 3, 2010, 2 pages +.
Cationic photoinitiators Sigma-Aldrich, from www.sigmaaldrich.com, 8 pages printed out Mar. 3, 2010.
Notice of Decision to Grant a Patent issued on May 20, 2008, on the counterpart Japanese Application No. 2004-260765.
Office Action issued in counterpart European Patent Application No. 04799821.6, dated Aug. 10, 2010.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Chemically amplified positive photosensitive thermosetting... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemically amplified positive photosensitive thermosetting..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemically amplified positive photosensitive thermosetting... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2694051

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.