MEMS sensor comprising a deformation-free back electrode

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Physical deformation

Reexamination Certificate

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Details

C257S414000, C257S416000, C257S417000, C257S418000, C257S419000, C257S420000, C257SE29324, C257S252000, C257S254000, C438S050000

Reexamination Certificate

active

07923792

ABSTRACT:
An MEMS sensor constructed on a base chip and having a capacitive mode of operation is disclosed. The MEMS sensor has a patterned layer construction applied on the base chip. A cutout is produced in the layer construction, the moveable electrode, for example a membrane, being arranged in said cutout. The cutout is spanned by a covering layer, which bears on the layer construction around the cutout and comprises the back electrode.

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patent: 6698295 (2004-03-01), Sherrer
patent: 6743654 (2004-06-01), Coffa et al.
patent: 2002/0067663 (2002-06-01), Loeppert et al.
patent: 2003/0155643 (2003-08-01), Freidhoff
patent: 2005/0101047 (2005-05-01), Freeman et al.
patent: 102 06 711 (2003-08-01), None
patent: 0 454 883 (1990-05-01), None
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patent: 2004-82260 (2004-03-01), None
patent: 2004-160607 (2004-06-01), None
patent: WO 90/00735 (1990-01-01), None

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